Sci-Tron technology, with unique and unparalleled etch sensitivity, is unlocking industry potential to develop ground-breaking products and boundary-pushing new applications
For manufacturers undertaking new product development who are seeking to produce the next generation of devices, Sci-Tron’s new metal-organic resists enable the e-beam lithographic and photolithographic fabrication of nanoscale features that are deeper, thinner and faster.
Offering bespoke resist development, Sci-Tron work with end-users to combine the high performance of Sci-Tron technology with customers’ existing processes to design new resists to enable fabrication of unique devices.
A paradigm shift in etch performance, Sci-Tron resists are based on a novel modular design where the strength of the underlying chemistry allows variation of each component and performance optimisation.
For more information, please contact:
Clare Arkwright
clare.arkwright@uominnovationfactory.com
+44 (0)161 603 7760 (office)*
+44 (0)7825 721 202 (mobile)
*As a result of lockdown related to Covid-19, office landline numbers are not currently being monitored. Therefore, please email or phone an alternative number, where possible.
