Sci-Tron technology, with unique and unparalleled etch sensitivity, is unlocking industry potential to develop ground-breaking products and boundary-pushing new applications

For manufacturers undertaking new product development who are seeking to produce the next generation of devices, Sci-Tron’s new metal-organic resists enable the e-beam lithographic and photolithographic fabrication of nanoscale features that are deeper, thinner and faster.

Offering bespoke resist development, Sci-Tron work with end-users to combine the high performance of Sci-Tron technology with customers’ existing processes to design new resists to enable fabrication of unique devices.

A paradigm shift in etch performance, Sci-Tron resists are based on a novel modular design where the strength of the underlying chemistry allows variation of each component and performance optimisation.

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