Sci-Tron technology, with unique and unparalleled etch sensitivity, is unlocking industry potential to develop ground-breaking products and boundary-pushing new applications
For manufacturers undertaking new product development who are seeking to produce the next generation of devices, Sci-Tron’s new metal-organic resists enable the e-beam lithographic and photolithographic fabrication of nanoscale features that are deeper, thinner and faster.
Offering bespoke resist development, Sci-Tron work with end-users to combine the high performance of Sci-Tron technology with customers’ existing processes to design new resists to enable fabrication of unique devices.
A paradigm shift in etch performance, Sci-Tron resists are based on a novel modular design where the strength of the underlying chemistry allows variation of each component and performance optimisation.
For more information, you can click here www.sci-tron.com or contact their Project Manager.